Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
The expressive power of the data flow schemes of Dennis is evaluated. It is shown that data flow schemes have the power to express an arbitrary determinate functional. The proof involves a demonstration that “restricted data flow schemes” can simulate Turing Machines. This provides a new. simple basis for computability. © 1980, All rights reserved.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007
Da-Ke He, Ashish Jagmohan, et al.
ISIT 2007