David B. Mitzi
Journal of Materials Chemistry
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
David B. Mitzi
Journal of Materials Chemistry
R. Ghez, M.B. Small
JES
Frank Stem
C R C Critical Reviews in Solid State Sciences
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics