Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
No abstract available.
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Fausto Bernardini, Holly Rushmeier
Proceedings of SPIE - The International Society for Optical Engineering
Matthew A Grayson
Journal of Complexity