PaperHoles trapped near Mg2+ and Al3+ impurities in SrTiO3O.F. Schirmer, W. Berlinger, et al.Solid State Communications
PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
PaperKinetic model for the chemical vapor deposition of tungsten in the silane reduction processJulian J. HsiehJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films