Conference paper
High resolution 248 nm bilayer resist
Q. Lin, K.E. Petrillo, et al.
SPIE Advances in Resist Technology and Processing 1999
No abstract available.
Q. Lin, K.E. Petrillo, et al.
SPIE Advances in Resist Technology and Processing 1999
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Macromolecules
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J. Photopolym. Sci. Tech.
Thomas F. Magnera, V. Balaji, et al.
Macromolecules