Hiroshi Ito, Charlie Dalby, et al.
Macromolecules
Paper
Variable-Temperature 13C and 29Si CPMAS NMR Studies of Poly(di-n-hexylsilane)
Related
M.I. Sanchez, L.K. Sundberg, et al.
SPIE Photomask Technology + EUV Lithography 2013
R.D. Allen, Juliann Opitz, et al.
J. Photopolym. Sci. Tech.
Conference paper
Polysilanes: photochemistry and deep UV lithography
R.D. Miller, G.M. Wallraff, et al.
SPE Regional Technical Conference 1988