William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
In UV cure nanoimprint lithography the interfaces as well as the resist composition play an important role in determining the characteristics of the resulting patterned material, which can be used for subsequent pattern transfer, or be functional. It is important for applications that there be only rare defects, and that template release always be a clean process. In this paper fundamental physical and chemical aspects of the resist template interface are discussed, with a particular focus on how they influence the process of template removal. © 2008 CPST.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Ellen J. Yoffa, David Adler
Physical Review B
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures