Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We continue the line of investigation begun by Micchelli and Rivlin and consider optimal recovery problems inspired by Walsh's equiconvergence theorem. In these results there are two sequences of operators each of which converges to a function f analytic in a circle while remarkably their difference converges to zero in a larger circle. Our interpretation of this situation is by way of optimal recovery. © 1992, R. Oldenbourg Verlag. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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SPIE Photomask Technology + EUV Lithography 2009
Imran Nasim, Michael E. Henderson
Mathematics
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SPIE Advanced Lithography 2010