Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We continue the line of investigation begun by Micchelli and Rivlin and consider optimal recovery problems inspired by Walsh's equiconvergence theorem. In these results there are two sequences of operators each of which converges to a function f analytic in a circle while remarkably their difference converges to zero in a larger circle. Our interpretation of this situation is by way of optimal recovery. © 1992, R. Oldenbourg Verlag. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Photomask and Next-Generation Lithography Mask Technology 2004
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IEEE TPAMI
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WSC 2003