1 µm MOSFET VLSI Technology: Part VI― Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE JSSC
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3 results for Thomas P. Donohue
X-ray lithography for ≤100 nm ground rules in complex patterns
- Scott Hector
- Victor Pol
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
1 μm MOSFET VLSI Technology: Part VI—Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE T-ED