Surface reactions in the chemical vapor deposition of tungsten using WF6 and SiH4 on Al, PtSi, and TiN
- Ming L. Yu
- Kie Y. Ahn
- et al.
- 1990
- Journal of Applied Physics
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66 results for Ming L. Yu
Mechanisms controlling temperature dependent mechanical and electrical behavior of SiH4 reduced chemically vapor deposited W
- R.V. Joshi
- V. Prasad
- et al.
- 1990
- Journal of Applied Physics
Angular anisotropy in ion-surface charge transfer
- Ming L. Yu
- Benjamin N. Eldridge
- 1990
- Physical Review B
Local catalytic effect of cesium on the oxidation of silicon
- Hans-Joachim Ernst
- Ming L. Yu
- 1990
- Physical Review B
Surface chemistry of the WF6-based chemical vapor deposition of tungsten
- M.L. Yu
- K.Y. Ahn
- et al.
- 1990
- IBM J. Res. Dev
Influence of the 7×7-1×1 phase transition on the sticking of oxygen on Si(111)
- Ulrich Memmert
- Ming L. Yu
- 1989
- Chemical Physics Letters
Reaction of trimethylgallium in the atomic layer epitaxy of GaAs (100)
- Ming L. Yu
- Ulrich Memmert
- et al.
- 1989
- Applied Physics Letters
Gas/surface reactions in the chemical vapor deposition of tungsten using WF6/SiH4mixtures
- Ming L. Yu
- Benjamin N. Eldridge
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Low-energy neutral/ion backscattering at As/Si(001)
- H. Niehus
- K. Mann
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A time resolved study of velocity distributions in pulsed molecular beams
- Benjamin N. Eldridge
- Ming L. Yu
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films