Synthesis of Xylenyl Ether'Arylene Ether Sulfone Triblock Copolymers as Potential Modifiers for Polystyrene and Related Structures
- J.L. Hedrick
- H.R. Brown
- et al.
- 2002
- Macromolecules
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54 results for Donald C. Hofer
Acetylene-terminated polyimide cure studies using 13C Magic-Angle Spinning NMR on Isotopically Labeled Samples
- Sally A. Swanson
- William W. Fleming
- et al.
- 2002
- Macromolecules
Transfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
Correlation of UVIIHS resist chemistry to dissolution rate measurements
- J. Thackeray
- T.H. Fedynyshyn
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Thick film positive photoresist: development and resolution enhancement technique
- D.R. McKean
- T.P. Russell
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High temperature polymer foams
- J.L. Hedrick
- Jeff W. Labadie
- et al.
- 1993
- Polymer
Nanopore Foams of High Temperature Polymers
- Jeff W. Labadie
- James L. Hedrick
- et al.
- 1992
- IEEE Transactions on Components, Hybrids, and Manufacturing Technology