NITRIDED SiO//2 FILMS FOR VLSI APPLICATIONS.
- A. Ray
- C.J. Merz
- et al.
- 1984
- ECS Meeting 1984
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7 results for C.J. Merz
NITRIDED SiO//2 FILMS FOR VLSI APPLICATIONS.
- A. Ray
- C.J. Merz
- et al.
- 1984
- ECS Meeting 1984
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated Pressure
- A. Reisman
- J.M. Aitken
- et al.
- 2019
- JES
The Effects of Pressure, Temperature, and Time on the Annealing of lonizing Radiation Induced Insulator Damage in N-channel IGFET's
- A. Reisman
- C.J. Merz
- 2019
- JES
Nitridation of silicon in a multiwafer plasma system
- A. Reisman
- M. Berkenblit
- et al.
- 1984
- Journal of Electronic Materials
Heat dissipation from silicon chips in a vertical plate, elevated pressure cold wall system
- A. Reisman
- M. Berkenblit
- et al.
- 1982
- Journal of Electronic Materials