Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989
Publications
Date
Featured collections
Popular topics
58 results for Scott A. MacDonald
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
POLYMERIZATION OF 1-(TRIMETHYLSTANNYL)ALKYL METHACRYLATES: A NEW CLASS OF ORGANOTIN POLYMERS.
- Jeff W. Labadie
- Scott A. MacDonald
- et al.
- 1986
- ACS Division of Polymer Chemistry Anaheim Meeting 1986
A 2-layer resist system derived from trimethylsilylstyrene
- S.A. Macdonald
- R.D. Allen
- et al.
- 1989
- Proceedings of SPIE 1989
PHOTOINITIATED INTERFACIAL CATIONIC POLYMERIZATION.
- C.G. Willson
- Anders Hult
- et al.
- 1984
- ACS National Meeting 1984
Fundamental studies of airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
The importance of cage versus escape reactivity in the photochemistry of onium salts
- Nigel P. Hacker
- John L. Dektar
- et al.
- 1991
- J. Photopolym. Sci. Tech.
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
The effect of polymer structure on the efficiency of acid generation from triarylsulfonium salts
- Dennis R. McKean
- Ulrich P. Schaedeli
- et al.
- 2003
- Journal of Polymer Science Part A: Polymer Chemistry