Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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58 results for Scott A. MacDonald

Novolac based deep-uv resists
- - Dennis R. McKean
  - Scott A. Macdonald
  - et al.
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- - William D. Hinsberg
  - Scott A. MacDonald
  - et al.
- 1989
- Proceedings of SPIE 1989
POLYMERIZATION OF 1-(TRIMETHYLSTANNYL)ALKYL METHACRYLATES: A NEW CLASS OF ORGANOTIN POLYMERS.
- - Jeff W. Labadie
  - Scott A. MacDonald
  - et al.
- 1986
- ACS Division of Polymer Chemistry Anaheim Meeting 1986
A 2-layer resist system derived from trimethylsilylstyrene
- - S.A. Macdonald
  - R.D. Allen
  - et al.
- 1989
- Proceedings of SPIE 1989
PHOTOINITIATED INTERFACIAL CATIONIC POLYMERIZATION.
- - C.G. Willson
  - Anders Hult
  - et al.
- 1984
- ACS National Meeting 1984
Fundamental studies of airborne chemical contamination of chemically amplified resists
- - W.D. Hinsberg
  - Scott A. MacDonald
  - et al.
- 1993
- J. Photopolym. Sci. Tech.
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- - J.M.J. Frchet
  - J. Fahey
  - et al.
- 1992
- J. Photopolym. Sci. Tech.
The importance of cage versus escape reactivity in the photochemistry of onium salts
- - Nigel P. Hacker
  - John L. Dektar
  - et al.
- 1991
- J. Photopolym. Sci. Tech.
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- - Hiroshi Ito
  - L.A. Pederson
  - et al.
- 2019
- JES
The effect of polymer structure on the efficiency of acid generation from triarylsulfonium salts
- - Dennis R. McKean
  - Ulrich P. Schaedeli
  - et al.
- 2003
- Journal of Polymer Science Part A: Polymer Chemistry