Effect of gas impurity and ion bombardment on stresses in sputter-deposited thin films: A molecular-dynamics approach
- C.C. Fang
- F. Jones
- et al.
- 1993
- Journal of Applied Physics
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8 results for Fletcher Jones
Morphology-enhanced metal-alumina adhesion by depositing textured alumina films on textured Teflon substrates
- Chin-An Chang
- Chin-Jong Chan
- et al.
- 1991
- Applied Physics Letters
High rate radio frequency sputtering using in-phase plasma confinement
- James E. Lucy
- John Costable
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-rate reactive sputter deposition of aluminum oxide
- Fletcher Jones
- Joseph Logan
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-rate reactive sputter deposition of zirconium dioxide
- Fletcher Jones
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Radio frequency sputter deposition of si02 films at high rate
- J.S. Logar
- F. Jones
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A new method for determining electron beam proximity correction parameters in a double layer siloxane-diazo resist system
- Fletcher Jones
- Jurij Paraszczak
- et al.
- 1984
- Journal of Applied Physics
RD3D 〈Computer Simulation of Resist Development in Three Dimensions〉
- Fletcher Jones
- Jurij Paraszczak
- 1981
- IEEE T-ED