CMP Defect Reduction and Mitigation: Practices and Future Trends
- Wei-Tsu Tseng
- Carol Boye
- et al.
- 2021
- ASMC 2021
Publications
Date
Featured collections
Popular topics
17 results for Fee Li Lie
A Systematic Study on BEOL Defectivity Control for Future AI Application
- James H.-C. Chen
- Fee Li Lie
- et al.
- 2020
- ASMC 2020
SiGe FinFET for practical logic libraries by mitigating local layout effect
- G. Tsutsui
- Huimei Zhou
- et al.
- 2017
- VLSI Technology 2017
FINFET technology featuring high mobility SiGe channel for 10nm and beyond
- Dechao Guo
- G. Karve
- et al.
- 2016
- VLSI Technology 2016
DSA patterning options for FinFET formation at 7nm node
- Chi Chun Liu
- Elliott Franke
- et al.
- 2016
- SPIE Advanced Lithography 2016
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- Chi Chun Liu
- Fee Li Lie
- et al.
- 2015
- SPIE Advanced Lithography 2015
Fully On-Chip MAC at 14 nm Enabled by Accurate Row-Wise Programming of PCM-Based Weights and Parallel Vector-Transport in Duration-Format
- Pritish Narayanan
- Stefano Ambrogio
- et al.
- 2021
- IEEE T-ED