Trapping and Behavior of Particulates in a Radio Frequency Magnetron Plasma Etching Tool
- Edward F. Patterson
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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25 results for G.S. Selwyn
Plasma particulate contamination control. II. Self-cleaning tool design
- Gary S. Selwyn
- Edward F. Patterson
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena
- Gary S. Selwyn
- J. Heidenreich
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Particle trapping phenomena in radio frequency plasmas
- Gary S. Selwyn
- John E. Heidenreich
- et al.
- 1990
- Applied Physics Letters
In-situ Particulate Contamination Studies In Process Plasmas
- Gary S. Selwyn
- John S. McKillop
- et al.
- 1989
- Microelectronic Integrated Processing 1989
In situ plasma contamination measurements by HeNe laser light scattering: A case study
- J.S. Mckillop
- Kurt L. Haller
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Laser diagnostic studies of particulate contamination generated by etching plasmas
- G.S. Selwyn
- 1989
- ICOPS 1989
In situ laser diagnostic studies of plasma-generated particulate contamination
- G.S. Selwyn
- J. Singh
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma-Enhanced Photoemission Detection: A New Method for Real-Time Surface Monitoring During Plasma Processing
- J. Singh
- 1989
- IEEE JQE
LASER SPECTROSCOPY IN ELECTRONIC MATERIALS PROCESSING RESEARCH.
- R.W. Dreyfus
- J.M. Jasinski
- et al.
- 1986
- Laser Focus (Littleton, Massachusetts)