Correlation Between the Diffusive and Electrical Barrier Properties of the Interface in Polysilicon Contacted n+-p Junctions
- Johannes M.C. Stork
- Maurizio Arienzo
- et al.
- 1985
- IEEE T-ED
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34 results for C.Y. Wong
Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds
- F.M. D'Heurle
- C.S. Petersson
- et al.
- 1984
- Journal of Applied Physics
The poly-single crystalline silicon interface
- C.Y. Wong
- Alwin E. Michel
- et al.
- 1984
- Journal of Applied Physics
Grain boundary-solute interactions in polycrystalline silicon and germanium
- D.A. Smith
- C.R.M. Grovenor
- et al.
- 1984
- Ultramicroscopy