Mechanism of oxygen plasma etching of polydimethyl siloxane filmsN.J. ChouC.H. Tanget al.1985Applied Physics Letters
SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.J. ParaszczakE. Babichet al.1984Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena