High performance dielectrics and processes for ULSI interconnection technologies
- J. Paraszczak
- D. Edelstein
- et al.
- 1993
- IEDM 1993
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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22 results for E. Babich
A new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
Microlithographic applications of silicon-containing polymers and individual organosilicon compounds
- E. Babich
- 1998
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Silylation of (photo)resist materials using polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1989
- ACS National Meeting 1989
Chemical and physical aspects of multilayer resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1989
- Proceedings of SPIE 1989
Multilayer resist systems using polysiloxanes as etch masks
- J. Paraszczak
- J.M. Shaw
- et al.
- 1983
- Microlithography 1983
Organosilicon polymers for lithographic applications
- J.M. Shaw
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Cross-linking of poly{1,1-diaryl(alkyl,aryl) 1-silacyclobutanes} under electron beam and deep UV irradiation
- E. Babich
- S. Rishton
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Determination of Helium presence in the mask/wafer gap of X-ray lithography steppers
- Juan R. Maldonado
- Ron DellaGuardia
- et al.
- 1995
- Microelectronic Engineering
Comparison of vapor and liquid phase silylation processes of photoresists
- E. Babich
- J. Paraszczak
- et al.
- 1991
- Microelectronic Engineering