Chemical amplification for the design of sensitive E-beam and X-ray resist systems
- Hiroshi Ito
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
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127 results for Hiroshi Ito
Photochemically-induced acid-catalyzed polymer reactions for microlithography
- Hiroshi Ito
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Acid-catalyzed depolymerization of poly(α-methylstyrene) derivatives
- Hiroshi Ito
- William P. England
- 1989
- ACS National Meeting 1989
1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
Copolymer approach to the design of sensitive deep UV resist systems with high thermal stability and dry etch resistance
- Hiroshi Ito
- Mitsuru Ueda
- et al.
- 1988
- ACS PMSE 1988
Acidolytic and thermolytic conversion of poly(α-acetoxystyrene) derivatives to polyphenylacetylenes
- Hiroshi Ito
- Mitsuru Ueda
- 1989
- ACS PMSE 1989
Acid-catalyzed deprotection and rearrangement in resist design
- Hiroshi Ito
- Mitsuru Ueda
- et al.
- 1989
- ACS PMSE 1989
Anionic polymerization of isopropenyl t-butyl ketone
- Hiroshi Ito
- A.F. Renaldo
- 1989
- ACS Division of Polymer Chemistry Miami Beach Meeting 1989
Sensitive electron beam resist systems based on acid-catalyzed deprotection
- Hiroshi Ito
- Lester A. Pederson
- et al.
- 1989
- Proceedings of SPIE 1989
Aqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors
- Hiroshi Ito
- 1989
- Proceedings of SPIE 1989