A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials
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127 results for Hiroshi Ito
Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates
- Geuntak Lee
- Pil Sung Jo
- et al.
- 2008
- Macromolecules
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Development of new advanced resist materials for microlithography
- Hiroshi Ito
- 2008
- J. Photopolym. Sci. Tech.
High-aspect-ratio cylindrical nanopore arrays and their use for templating titania nanoposts
- Oun-Ho Park
- Joy Y. Cheng
- et al.
- 2008
- Advanced Materials
Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates
- Hiroshi Ito
- Brian C. Trinque
- et al.
- 2008
- J Polym Sci Part A
Characterization and lithographic application of calix[4]resorcinarene derivatives
- Hiroshi Ito
- Tomonari Nakayama
- et al.
- 2007
- Chemistry of Materials
Chemical amplification resists: Laboratory curiosity to paradigm
- Hiroshi Ito
- 2007
- J. Photopolym. Sci. Tech.
Smart self-adjustment of surface micelles of an amphiphilic block copolymer to nanoscopic pattern boundaries
- Bokyung Yoon
- June Huh
- et al.
- 2007
- Advanced Materials
Bilayer resists for 193 nm lithography: SSQ and POSS
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2006
- J. Photopolym. Sci. Tech.