Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994
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127 results for Hiroshi Ito
Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Living anionic polymerization of silyl-protected hydroxystyrenes at room temperature
- Hiroshi Ito
- Arno Knebelkamp
- et al.
- 1992
- ACS PMSE 1992
Effects of polymer end groups on chemical amplification
- Hiroshi Ito
- William P. England
- et al.
- 1992
- Microlithography 1992
Polymerization of exo-methylene styrenic monomers. Effect of α,α-cyclization on reactivity and stereoregularity
- Hiroshi Ito
- Mitsuru Ueda
- 1991
- ACS Division of Polymer Chemistry Atlanta Meeting 1991
Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes
- Hiroshi Ito
- Klaas Schildknegt
- et al.
- 1991
- Microlithography 1991
Photochemically-induced acid-catalyzed polymer reactions for microlithography
- Hiroshi Ito
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Chemical amplification for the design of sensitive E-beam and X-ray resist systems
- Hiroshi Ito
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Acid-catalyzed depolymerization of poly(α-methylstyrene) derivatives
- Hiroshi Ito
- William P. England
- 1989
- ACS National Meeting 1989