Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science
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127 results for Hiroshi Ito
Chemical amplification in the design of dry developing resist materials
- Hiroshi Ito
- C. Grant Willson
- 2004
- Polymer Engineering & Science
Reactive dissolution kinetics of lithographic copolymers
- William Hinsberg
- Frances Houle
- et al.
- 2004
- Microlithography 2004
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. III. Kinetics and Monomer Reactivities in the Copolymerization of t-Butyl 2-Trifluoromethylacrylate and Methacrylate with Styrene Bearing Hexafluoroisopropanol
- Hiroshi Ito
- Masaki Okazaki
- et al.
- 2004
- J Polym Sci Part A
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. II. Kinetics, Monomer Reactivities, and Penultimate Effect in Their Copolymerization with Norbornenes and Vinyl Ethers
- Hiroshi Ito
- Masaki Okazaki
- et al.
- 2004
- J Polym Sci Part A
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. I. Kinetics of Their Copolymerization with Norbornenes and Vinyl Ethers as Studied by in situ 1H NMR Analysis
- Hiroshi Ito
- Dolores C. Miller
- 2004
- J Polym Sci Part A
Fluoropolymer resists: Fundamentals and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2004
- J. Photopolym. Sci. Tech.
Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures