Novel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
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127 results for Hiroshi Ito
Novel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials
- Robert D. Allen
- Carl E. Larson
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Fundamental aspects of norbornene-maleic anhydride co- and terpolymers for 193 nm lithography: Polymerization chemistry and polymer properties
- Hiroshi Ito
- Dolores C. Miller
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Investigation of deep UV resists by NMR: Residual casting solvents, chemistries, and PAG decomposition in film
- Hiroshi Ito
- Mark Sherwood
- 1999
- J. Photopolym. Sci. Tech.
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- P. Rao Varanasi
- Ann Marie Mewherter
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Evolution and progress of deep uv resist materials
- Hiroshi Ito
- 1998
- J. Photopolym. Sci. Tech.
Dissolution kinetics and PAG interaction of phenolic resins in chemically amplified resists
- Hiroshi Ito
- Debra-Fenzel Alexander
- et al.
- 1997
- J. Photopolym. Sci. Tech.