M. Hargrove, S.W. Crowder, et al.
IEDM 1998
Paper
Development of 157 nm positive resists
Abstract
A 157 nm resist design that utilizes a hexafluoroisopropanol as an acidic group and an α-trifluoromethylacrylic moiety as a repeat unit is described. The fluoroalcohol group is pendant form either norbornene or styrene. The residual casting solvent concentration is much smaller in the fluoropolymers than in the hydrocarbon counterparts.
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