Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
A 157 nm resist design that utilizes a hexafluoroisopropanol as an acidic group and an α-trifluoromethylacrylic moiety as a repeat unit is described. The fluoroalcohol group is pendant form either norbornene or styrene. The residual casting solvent concentration is much smaller in the fluoropolymers than in the hydrocarbon counterparts.
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Mark W. Dowley
Solid State Communications
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting