D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
A 157 nm resist design that utilizes a hexafluoroisopropanol as an acidic group and an α-trifluoromethylacrylic moiety as a repeat unit is described. The fluoroalcohol group is pendant form either norbornene or styrene. The residual casting solvent concentration is much smaller in the fluoropolymers than in the hydrocarbon counterparts.
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Kigook Song, Robert D. Miller, et al.
Macromolecules
John G. Long, Peter C. Searson, et al.
JES