Electron beam fabrication and characterization of fresnel zone plates for soft x-ray microscopy
- D. Kern
- P. Coane
- et al.
- 1989
- Proceedings of SPIE 1989
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29 results for R. Viswanathan
Electron beam pattern writer for x-ray masks
- R. Viswanathan
- A.D. Wilson
- et al.
- 1989
- Proceedings of SPIE 1989
Patterning of 100 nm features using X-ray lithography
- Azalia A. Krasnoperova
- Scott Hector
- et al.
- 1997
- J. Photopolym. Sci. Tech.
Image processing using shape recognition for alignment to damaged registration marks in electron beam lithography
- E. Kratschmer
- D.P. Klaus
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Adaptive wiring for 20 nm scale epitaxial silicon Ohmic contacts to silicon nanowires
- M.J. Rooks
- G.M. Cohen
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes
- Steven Steen
- Sharee J. McNab
- et al.
- 2006
- Microelectronic Engineering
Experimental optimization of the electron-beam proximity effect forward scattering parameter
- M.J. Rooks
- N. Belic
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
- M.J. Rooks
- E. Kratschmer
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
E-beam writing: A next-generation lithography approach for thin-film head critical features
- R.E. Fontana
- J.A. Katine
- et al.
- 2002
- IEEE Transactions on Magnetics
Ultrasonic and dip resist development processes for 50 nm device fabrication
- K.L. Lee
- J. Bucchignano
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures