Missing Via Defect Capture Enhancement Using a Novel, High-Precision Array Segmentation Inspection Technique
- Graham Jensen
- Vidyasagar Anantha
- et al.
- 2021
- ASMC 2021
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9 results for Shravan Matham
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- SPIE Advanced Lithography 2020
High-throughput, nondestructive assessment of defects in patterned epitaxial films on silicon by machine learning-enabled broadband plasma optical measurements
- Shravan Matham
- C. Durfee
- et al.
- 2019
- ASMC 2019
Defect detection strategies and process partitioning for SE EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2018
- SPIE Advanced Lithography 2018
Development of TiO2 containing hardmasks through PEALD deposition
- Anuja De Silva
- Indira Seshadri
- et al.
- 2017
- SPIE Advanced Lithography 2017
Printability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Defect detection strategies and process partitioning for single-expose EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition
- Anuja De Silva
- Indira Seshadri
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS