Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
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Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: Laser-induced fluorescence analysis, chemical analysis, and doping studies
- R. Srinivasan
- Bodil Braren
- et al.
- 1986
- Journal of the Optical Society of America B: Optical Physics
LOW TEMPERATURE UV LASER ETCHING OF PMMA: ON THE MECHANISM OF ABLATIVE PHOTODECOMPOSITION (APD).
- Bodil Braren
- David Seeger
- 1986
- Journal of Polymer Science, Part C: Polymer Letters