Effect of excess silicon on behavior of LPCVD WSix films on silicon
- R.V. Joshi
- Young H. Kim
- et al.
- 1988
- Thin Solid Films
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6 results for T. Lin
Properties of selective low pressure chemically vapor deposited tungsten films produced by hydrogen reduction in a cold wall system
- R.V. Joshi
- D.A. Smith
- et al.
- 1988
- Thin Solid Films
Tungsten-rhenium alloys as diffusion barriers between aluminum and silicon
- S.-E. Hörnström
- T. Lin
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Relationship between substrate bias and microstructure in magnetron-sputtered AlCu films
- T. Lin
- K.Y. Ahn
- et al.
- 1987
- Thin Solid Films
Effects of substrate temperature on copper distribution, resistivity, and microstructure in magnetron-sputtered Al-Cu films
- K.Y. Ahn
- T. Lin
- et al.
- 1987
- Thin Solid Films
Transport in refractory metals and their interaction with SiO2: Comparison of tungsten and molybdenum
- L. Krusin-Elbaum
- M.O. Aboelfotoh
- et al.
- 1987
- Thin Solid Films