The effect of plasma chemistry on the damage induced to porous SiCOH dielectrics
- A. Grill
- V.V. Patel
- 2006
- JES
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50 results for V.V. Patel
Hydrogen plasma effects on ultralow-k porous SiCOH dielectrics
- A. Grill
- V. Sternhagen
- et al.
- 2005
- Journal of Applied Physics
Optimization of SiCOH dielectrics for integration in a 90 nm CMOS technology
- A. Grill
- D. Edelstein
- et al.
- 2004
- IITC 2004
Interaction of hydrogen plasma with extreme low-k SiCOH dielectrics
- A. Grill
- V.V. Patel
- 2004
- JES
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Porosity in plasma enhanced chemical vapor deposited SiCoH dielectrics: A comparative study
- A. Grill
- V.V. Patel
- et al.
- 2003
- Journal of Applied Physics
Static frequency divider circuit using 0.15 μm gate length Si0.2Ge0.8/Si0.7Ge0.3 p-MODFETs
- D. Singh
- S.J. Koester
- et al.
- 2003
- Electronics Letters
Characteristics of low-k and ultralow-k PECVD deposited SiCOH films
- A. Grill
- V.V. Patel
- et al.
- 2002
- MRS Proceedings 2002
Effects of precursor additives on the stability of plasma enhanced chemical vapor deposited a-GeC(O):H films
- A. Grill
- S. Guilley
- et al.
- 2002
- Journal of Materials Research
SiCOH dielectrics: From low-κ to Ultralow-κ by PECVD
- A. Grill
- D. Edelstein
- et al.
- 2001
- ADMETA 2001