Oxidation of titanium, manganese, iron, and niobium silicides: Marker experiments
- L. Stolt
- O. Thomas
- et al.
- 1990
- Journal of Applied Physics
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25 results for O. Thomas
Respective mobilities of metal and silicon in disilicides: Bilayers of chromium with molybdenum or tungsten
- O. Thomas
- T.G. Finstad
- et al.
- 1990
- Journal of Applied Physics
Oxidation and formation mechanisms in disilicides: VSi2 and CrSi2, inert marker experiments and interpretation
- O. Thomas
- L. Stolt
- et al.
- 1990
- Journal of Applied Physics
Reaction of titanium with germanium and silicon-germanium alloys
- O. Thomas
- S.L. Delage
- et al.
- 1989
- Applied Physics Letters
Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- O. Thomas
- A. Charai
- et al.
- 1989
- Thin Solid Films
Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition
- C.Sture Petersson
- Harry J. Whitlow
- et al.
- 1989
- Nuclear Inst. and Methods in Physics Research, B
Nucleation and growth in the reaction of titanium with germanium and some silicon-germanium alloys
- O. Thomas
- F.M. D'Heurle
- et al.
- 1989
- Applied Surface Science
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- J.M.E. Harper
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Bilayers with chromium disilicide: Chromium-vanadium
- T.G. Finstad
- O. Thomas
- et al.
- 1989
- Applied Surface Science
Some properties of CrxV1-xSi2 and CrxMo1-xSi2 thin films
- O. Thomas
- Steve Molis
- et al.
- 1989
- Applied Surface Science