Mechanism of the Photochemical Degradation of Poly(di-n-alkylsilanes) in Solution
- Takashi Karatsu
- Josef Michl
- et al.
- 2002
- JACS
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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7 results for Takashi Karatsu
Solution Photochemistry of Poly(di-n-alkylsilane)s. An EPR-ENDOR Study of the Structure of the Persistent Radicals
- Allan J. McKinley
- Takashi Karatsu
- et al.
- 1991
- JACS
Polysilanes: solution photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- ACS PMSE 1988
Polysilanes: photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- SPE Regional Technical Conference 1988
Solution photochemistry of poly(dialkylsilanes): A new class of photoresists
- Josef Michl
- John W. Downing
- et al.
- 2009
- Pure and Applied Chemistry
Polysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
Photodegradation of Poly(dialkylsilane)s In Solution: The Persistent Radicals Have an Unexpected Structure
- Allan J. McKinley
- Takashi Karatsu
- et al.
- 2002
- Organometallics