Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
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8 results for S.W. Robey
A photoemission investigation of surface processes affecting the reactive ion etching of TiSi2 in CF4
- S.W. Robey
- M.A. Jaso
- et al.
- 1989
- Journal of Applied Physics
Fluorination of the silicon dioxide surface during reactive ion and plasma etching in halocarbon plasmas
- S.W. Robey
- G.S. Oehrlein
- 1989
- Surface Science
Technique for selective etching of Si with respect to Ge
- A.A. Bright
- Subramanian S. Iyer
- et al.
- 1988
- Applied Physics Letters
Surface processes in CF4/O2 reactive etching of silicon
- Gottlieb S. Oehrlein
- Steve W. Robey
- et al.
- 1988
- Applied Physics Letters
Medium energy ion scattering analysis of reactive ion etched Si(001) surfaces
- M. Copel
- R.M. Tromp
- et al.
- 1988
- Applied Physics Letters
Valence-band photoemission and electron energy-loss studies of reactive ion etched silicon dioxide
- S.W. Robey
- G.S. Oehrlein
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray photoemission spectroscopy characterization of silicon surfaces after CF4/H2magnetron ion etching: Comparisons to reactive ion etching
- Gottlieb S. Oehrlein
- Arthur A. Bright
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films