A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.