Stability of electrical properties of nitrogen-rich, silicon-rich, and stoichiometric silicon nitride films
- W.S. Lau
- S.J. Fonash
- et al.
- 1989
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.