Radiometric consistency in source specifications for lithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2008
- SPIE Advanced Lithography 2008
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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11 results for Donis Flagello
Experimental verification of high numerical aperture effects in photoresist
- Donis G. Flagello
- Tom Milster
- 1994
- Microlithography 1994
Comparison of scalar and vector diffraction modelling for deep-UV lithography
- Bruce W. Smith
- Donis G. Flagello
- et al.
- 1993
- Microlithography 1993
Vector diffraction analysis of phase-mask imaging in photoresist films
- Donis G. Flagello
- Alan E. Rosenbluth
- 1993
- Microlithography 1993
Three-dimensional modeling of high-numerical-aperture imaging in thin films
- D. Flagello
- Tom D. Milster
- 1992
- SPIE OE/LASE 1992
Polymeric optical waveguides
- J.M. Hagerhorst-Trewhella
- J. Gelorme
- et al.
- 1989
- Proceedings of SPIE 1989
Practical characterization of 0.5 μm optical lithography
- Donis G. Flagello
- Andrew T. S. Pomerene
- 1989
- Proceedings of SPIE 1989
High-numerical-aperture effects in photoresist
- Donis G. Flagello
- Tom D. Milster
- 1997
- Applied Optics
Theory of high-NA imaging in homogeneous thin films
- Donis G. Flagello
- Tom Milster
- et al.
- 1996
- Journal of the Optical Society of America A: Optics and Image Science, and Vision
Understanding high numerical aperture optical lithography
- D. Flagello
- Alan E. Rosenbluth
- et al.
- 1992
- Microelectronic Engineering