High temperature reactive ion etching of indium-tin oxide with HBr and CH4 mixtures
- Yue Kuo
- T.L. Tai
- 1998
- JES
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46 results for Yue Kuo
A 10.5-in.-diagonal SXGA active-matrix display
- E.G. Colgan
- P.M. Alt
- et al.
- 1998
- IBM J. Res. Dev
Doping gas effects on plasma enhanced chemical vapor deposition on heavily phosphorus-doped n+ silicon film
- Yue Kuo
- 1997
- Applied Physics Letters
Anomalous high rate reactive ion etching process for indium tin oxide
- Y. Kuo
- 1997
- Japanese Journal of Applied Physics, Part 2: Letters
Electron beam induced damage in N-rich SiNx films deposited by plasma enhanced chemical vapour deposition
- Ch.B. Lioutas
- N. Vouroutzis
- et al.
- 1997
- Thin Solid Films
High temperature reactive ion etching of indium-tin oxide
- Yue Kuo
- 1997
- JES
A six-mask TFT-LCD process using copper-gate metallurgy
- P.M. Fryer
- E.G. Colgan
- et al.
- 1997
- Journal of the Society for Information Display
Microstructure modifications induced by bonded hydrogen in N-rich SiNx:H films
- E.C. Paloura
- Ch.B. Lioutas
- et al.
- 1996
- Journal of Applied Physics
Polycrystalline silicon formation by pulsed rapid thermal annealing of amorphous silicon
- Yue Kuo
- P. Kozlowski
- 1996
- Applied Physics Letters
Nonphotosensitive, vertically redundant two-channel a-Si:H thin film transistor
- Yue Kuo
- 1996
- JES