Effect of gas impurity and ion bombardment on stresses in sputter-deposited thin films: A molecular-dynamics approach
- C.C. Fang
- F. Jones
- et al.
- 1993
- Journal of Applied Physics
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3 results for V. Prasad
Non-self-limiting nature of silicon reduction of WF6 in cold wall systems
- R.V. Joshi
- V. Prasad
- et al.
- 1992
- Journal of Applied Physics
Mechanisms controlling temperature dependent mechanical and electrical behavior of SiH4 reduced chemically vapor deposited W
- R.V. Joshi
- V. Prasad
- et al.
- 1990
- Journal of Applied Physics