Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithographyR. ViswanathanDavid Seegeret al.1994Microelectronic Engineering
Electromigration failure due to interfacial diffusion in fine Al alloy linesC.-K. HuM.B. Smallet al.1993Applied Physics Letters
Focused ion beam imaging of grain growth in copper thin filmsJ. GuptaJ.M.E. Harperet al.1992Applied Physics Letters