Current-driven excitations in magnetic multilayer nanopillars from 4.2 K to 300 K
- M. Tsoi
- J.Z. Sun
- et al.
- 2004
- Physical Review B - CMMP
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51 results for M.J. Rooks
80 nm gate-length Si/Si0.7Ge0.3 n-MODFET with 194 GHz fmax
- S.J. Koester
- K.L. Saenger
- et al.
- 2003
- Electronics Letters
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
- M.J. Rooks
- E. Kratschmer
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Batch-fabricated spin-injection magnetic switches
- J.Z. Sun
- D.J. Monsma
- et al.
- 2002
- Applied Physics Letters
E-beam writing: A next-generation lithography approach for thin-film head critical features
- R.E. Fontana
- J.A. Katine
- et al.
- 2002
- IEEE Transactions on Magnetics
Shot Noise Measurements in Diffusive Normal Metal - Superconductor (N-S) Junctions
- A.A. Kozhevnikov
- R.J. Schoelkopf
- et al.
- 2000
- Journal of Low Temperature Physics
Exchange-biased magnetic tunnel junctions and application to nonvolatile magnetic random access memory (invited)
- S.S.P. Parkin
- K.P. Roche
- et al.
- 1999
- Journal of Applied Physics
Application of 4-methyl-1-acetoxycalix[6]arene resist to complementary metal-oxide-semiconductor gate processing
- Michael J. Rooks
- Ari Aviram
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
- R.C. Tiberio
- D.W. Carr
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures