Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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76 results for E. Gusev

Energy Distribution of Interface Traps in High-K Gated MOSFETs
- - J.-P. Han
  - E.M. Vogel
  - et al.
- 2003
- VLSI Technology 2003
Ultrathin HfO₂ films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
- - E. Gusev
  - C. Cabral Jr.
  - et al.
- 2003
- Microelectronic Engineering
Mobility enhancement in strained Si NMOSFETs with HfO₂ gate dielectrics
- - K. Rim
  - E. Gusev
  - et al.
- 2002
- VLSI Technology 2002
Hot-carrier charge trapping and reliability in high-K dielectrics
- - Arvind Kumar
  - Tak H. Ning
  - et al.
- 2002
- VLSI Technology 2002
Low temperature metal organic chemical vapor deposition of aluminum oxide thin films for advanced CMOS gate dielectric applications
- - Spyridon Skordas
  - Filippos Papadatos
  - et al.
- 2002
- MRS Proceedings 2002
Ultrathin high-K metal oxides on silicon: Processing, characterization and integration issues
- - E. Gusev
  - E. Cartier
  - et al.
- 2001
- Microelectronic Engineering
Interfacial microstructure of NiSi_x/HfO₂/SiO_x/Si gate stacks
- - M. Gribelyuk
  - C. Cabral Jr.
  - et al.
- 2007
- Thin Solid Films
Measurements of metal gate effective work function by x-ray photoelectron spectroscopy
- - Yuri Lebedinskii
  - Andrei Zenkevich
  - et al.
- 2007
- Journal of Applied Physics
Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges
- - Evgeni P. Gusev
  - Vijay Narayanan
  - et al.
- 2006
- IBM J. Res. Dev
Thermal ammonia nitridation on HfO₂ and hafnium silicates thin films
- - J.-J. Ganem
  - I. Trimaille
  - et al.
- 2006
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms