Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Yayi Wei

Performance of tri-layer process required for 22nm and beyond
- - Yayi Wei
  - Martin Glodde
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- - O.R. Wood II
  - D. Back
  - et al.
- 2007
- SPIE Advanced Lithography 2007
A year in the life of an immersion lithography alpha tool at albany NanoTech
- - Michael Tittnich
  - John Hartley
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Are extreme ultraviolet resists ready for the 32 nm node?
- - Karen Petrillo
  - Yayi Wei
  - et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures