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SPIE Advanced Lithography 2006
Conference paper
10 Jul 2006

A year in the life of an immersion lithography alpha tool at albany NanoTech

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Abstract

No abstract available.

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Date

10 Jul 2006

Publication

SPIE Advanced Lithography 2006

Authors

  • Michael Tittnich
  • John Hartley
  • Greg Denbeaux
  • Uzo Okoroanyanwu
  • Harry Levinson
  • Karen Petrillo
  • Chris Robinson
  • Dario Gil
  • Dan Corliss
  • David Back
  • Stefan Brandl
  • Christian Schwarz
  • Frank Goodwin
  • Yayi Wei
  • Brian Martinick
  • Richard Housley
  • Peter Benson
  • Kevin Cummings
IBM-affiliated at time of publication

Topics

  • Mathematical Sciences
  • Physical Sciences
  • Computer Science

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