Publications

8 results for R. Muthinti

Imaging, Modeling and Engineering of Strain in Gate-All-Around Nanosheet Transitors
- - S. Reboh
  - V. Boureau
  - et al.
- 2019
- IEDM 2019
Self-Allancd Gate Contact (SAGC) for CMOS technology scaling beyond 7nm
- - Ruilong Xie
  - Chanro Park
  - et al.
- 2019
- VLSI Technology 2019
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
- - N. Loubet
  - T.B. Hook
  - et al.
- 2017
- VLSI Technology 2017
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- - Ravi Bonam
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
An OCD perspective of line edge and line width roughness metrology
- - Ravi Bonam
  - R. Muthinti
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Air spacer for 10nm FinFET CMOS and beyond
- - K. Cheng
  - C. Park
  - et al.
- 2016
- IEDM 2016
Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- - R. Muthinti
  - Nicolas Loubet
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line metrology strategy for self-aligned quadruple patterning
- - Robin Chao
  - Mary Breton
  - et al.
- 2016
- SPIE Advanced Lithography 2016