Publications

8 results for A. R. Hubbard

Multiple-Vt Solutions in Nanosheet Technology for High Performance and Low Power Applications
- - Ruqiang Bao
  - Reinaldo A. Vega
  - et al.
- 2019
- IEDM 2019
Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019
The defect mitigation on EUV stack by track based technology
- - Naoki Shibata
  - Lior Huli
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Track based techniques to improve high-resolution EUV patterning defectivity
- - Naoki Shibata
  - Lior Huli
  - et al.
- 2018
- EUVL 2018
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- - Koichi Hontake
  - Lior Huli
  - et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Driving down defect density in composite EUV patterning film stacks
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Essential edge protection techniques for successful multi-wafer stacking
- - Joshua Rubin
  - Kevin Winstel
  - et al.
- 2015
- S3S 2015
High performance extremely thin SOI (ETSOI) hybrid CMOS with Si channel NFET and strained SiGe channel PFET
- - K. Cheng
  - A. Khakifirooz
  - et al.
- 2012
- IEDM 2012