Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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4 results for Takashi Shimoaoki

Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019
Defect detection strategies and process partitioning for SE EUV patterning
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- - Koichi Hontake
  - Lior Huli
  - et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Defect detection strategies and process partitioning for single-expose EUV patterning
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS