Publications

9 results for Shinichiro Kawakami

Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019
The defect mitigation on EUV stack by track based technology
- - Naoki Shibata
  - Lior Huli
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Defect detection strategies and process partitioning for single-expose EUV patterning
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Track based techniques to improve high-resolution EUV patterning defectivity
- - Naoki Shibata
  - Lior Huli
  - et al.
- 2018
- EUVL 2018
Defect detection strategies and process partitioning for SE EUV patterning
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- - Koichi Hontake
  - Lior Huli
  - et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Driving down defect density in composite EUV patterning film stacks
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Optimization of pitch-split double patterning phoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- ASMC 2011