Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
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43 results for D. Medeiros
Current Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Sensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- Dario L. Goldfarb
- Libor Vyklicky
- et al.
- 2008
- J. Photopolym. Sci. Tech.