Trilayer development for 193 nm immersion lithography
- Sean Burns
- Martin Burkhardt
- et al.
- 2007
- J. Photopolym. Sci. Tech.
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43 results for D. Medeiros
Bilayer resists for 193 nm lithography: SSQ and POSS
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Recent advances in the development of chemically amplified resists for applications in electron beam lithography
- David R. Medeiros
- 2002
- J. Photopolym. Sci. Tech.
Measurements of acid generation by extreme ultraviolet irradiation in lithographic films
- Martin Glodde
- Dario L. Goldfarb
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
[(CH3)3NCH2CH2NH3] SNl4: A layered perovskite with quaternary/primary ammonium dications and short interlayer iodine-iodine contacts
- Zhengtao Xu
- David B. Mitzi
- et al.
- 2003
- Inorganic Chemistry
Low-temperature melt processing of organic-inorganic hybrid films
- David B. Mitzi
- David R. Medeiros
- et al.
- 2002
- Chemistry of Materials
Intercalated organic-inorganic perovskites stabilized by fluoroaryl-aryl interactions
- David B. Mitzi
- David R. Medeiros
- et al.
- 2002
- Inorganic Chemistry
Characterization and acid diffusion measurements of new strong acid photoacid generators
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
The effect of humidity on deprotection kinetics in chemically amplified resists
- Sean D. Burns
- David R. Medeiros
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering