High performance and low power transistors integrated in 65nm bulk CMOS technologyZ. LuoA. Steegenet al.2004IEDM 2004
A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first processX. ChenS. Samavedamet al.2008VLSI Technology 2008
Stress proximity technique for performance improvement with dual stress liner at 45nm technology and beyondX. ChenS. Fanget al.2006VLSI Technology 2006