Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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8 results for Greg Denbeaux
A year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
Measurements of acid generation by extreme ultraviolet irradiation in lithographic films
- Martin Glodde
- Dario L. Goldfarb
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Are extreme ultraviolet resists ready for the 32 nm node?
- Karen Petrillo
- Yayi Wei
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Polarization effects in coherent scattering from magnetic specimen: Implications for x-ray holography, lensless imaging, and correlation spectroscopy
- S. Eisebitt
- M. Lörgen
- et al.
- 2003
- Physical Review B - CMMP
Temperature and ion irradiation dependence of magnetic domains and microstructure in Co/Pt multilayers
- G.J. Kusinski
- G. Thomas
- et al.
- 2002
- Journal of Applied Physics
Magnetic imaging of ion-irradiation patterned Co/Pt multilayers using complementary electron and photon probes
- G.J. Kusinski
- K.M. Krishnan
- et al.
- 2001
- Applied Physics Letters
Soft-x-ray small-angle scattering as a sensitive probe of magnetic and charge heterogeneity
- J.B. Kortright
- Sang-Koog Kim
- et al.
- 2001
- Physical Review B - CMMP