Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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39 results for Linda K. Sundberg

Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- - Ratnam Sooriyakumaran
  - Hoa Truong
  - et al.
- 2005
- Microlithography 2005
Studies of acid diffusion in low Ea chemically amplified photoresists
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Templating organosilicate vitrification using unimolecular self-organizing polymers prepared from tandem ring opening and atom transfer radical polymerizations
- - T. Magbitang
  - V.Y. Lee
  - et al.
- 2004
- Macromolecular Symposia
Optimized acid release underlayers for 157 nm lithography
- - Carl E. Larson
  - G.M. Wallraff
  - et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- - William Hinsberg
  - Gregory Wallraff
  - et al.
- 2004
- Microlithography 2004
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- - R. Sooriyakumaran
  - B. Davis
  - et al.
- 2004
- Microlithography 2004
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- - R.D. Allen
  - G. Breyta
  - et al.
- 2006
- J. Photopolym. Sci. Tech.
Design of protective topcoats for immersion lithography
- - Robert D. Allen
  - Phillip J. Brock
  - et al.
- 2005
- J. Photopolym. Sci. Tech.