Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
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39 results for Linda K. Sundberg
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Templating organosilicate vitrification using unimolecular self-organizing polymers prepared from tandem ring opening and atom transfer radical polymerizations
- T. Magbitang
- V.Y. Lee
- et al.
- 2004
- Macromolecular Symposia
Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Design of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.